About this opportunity
Micron lists this Principal Diffusion & Gate Dielectric Engineer opportunity in boise, Idaho. Review the employer’s description below for duties, qualifications and application requirements.
Job description
Micron Technology is seeking a Principal Diffusion Process Development Engineer to lead FEOL diffusion, annealing, and gate oxidation for advanced DRAM devices. You will scale ultra-thin gate dielectrics, drive development from concept to production, and optimize equipment platforms with a focus on reliability and manufacturability.
You will collaborate with process development, device engineering, equipment, and manufacturing teams to support future nodes, applying AI/LLM tools to boost
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Worksite address
boise, ID, 83708, US
Who can apply
Review the original listing for work authorization, qualifications and employer requirements.